| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-134372
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13396
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13398
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2202-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13439
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1259
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1368 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 |
| filingDate |
2014-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad73abba4da969352b4e91c27e382c2d |
| publicationDate |
2015-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015098183-A1 |
| titleOfInvention |
Active matrix substrate manufacturing method, display apparatus manufacturing method, and display apparatus |
| abstract |
According to an embodiment of the present invention, an active matrix substrate manufacturing method includes: a step (a) for forming a thin film transistor (10) on a substrate (11); a step (b) for forming an interlayer insulating layer (22) that covers the thin film transistor; a step (c) for forming a first electrode (32p) after the step (b); a step (d) for forming, after the step (c), a photo spacer (38) by performing patterning by applying a photosensitive resin material on the substrate; and a step (e) for performing, after the step (d), plasma processing using a gas, which contains a fluorine-based gas but does not contain oxygen gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109637362-A |
| priorityDate |
2013-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |