| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de498babb0c04a00ceb653738877b147 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F15-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C225-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F15-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C225-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-16 |
| filingDate |
2014-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14f87cd55c3b72d5ceb3f3a479800cea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f7df5dca00e4b4f6b8015ce50aa19ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a384b0dd8bc9e7c236ae673d124a708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec1251d19b8212592450a23389f44c77 |
| publicationDate |
2015-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015093177-A1 |
| titleOfInvention |
Ruthenium compound, raw material for forming thin film, and method for producing thin film |
| abstract |
The present invention provides a ruthenium compound (a precursor) which can be used in a chemical vapor deposition method, particularly an ALD method, and which has good reactivity with a reactive gas, a high vapor pressure and a low melting point. Specifically, the present invention provides a ruthenium compound represented by general formula (I), and preferably provides a ruthenium compound as mentioned above in which R 1 and R 2 in general formula (I) independently represent an ethyl group or an isopropyl group.n(In the formula, R 1 , R 2 and R 3 independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, wherein the sum total of the number of carbon atoms in R 1 and the number of carbon atoms in R 2 is 3 to 10.) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10815260-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6027657-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017033913-A1 |
| priorityDate |
2013-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |