| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_283b0c148f1ce389bdf4619d3016e748 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-06 |
| filingDate |
2014-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_503299480785e7c0b8c7082c981c7660
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70e14ab60cc0c2afc96540a713632e7d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_171746cb8d0572b6ed52a01246d554dc |
| publicationDate |
2015-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2015049135-A1 |
| titleOfInvention |
Substrate with descaling properties and process for obtaining such a substrate |
| abstract |
The invention relates to a composition comprising (i) at least a first silicon-based precursor of formula (X)(Z) n Si(OR) 3-n and at least a second silicon-based precursor of formula Y n' -Si(OR') 4-n' , in order to form a layer, more particularly a descaling layer on at least one portion of at least one of the faces of a substrate. The invention also relates to a process for forming such a layer on a substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110054986-A |
| priorityDate |
2013-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |