Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate |
2014-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bf0adc57080e59879c1d8e5cbeccc6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_523e5f0c7418f04134cf08ce1d859e56 |
publicationDate |
2015-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2015046164-A1 |
titleOfInvention |
Polishing composition and production method therefor |
abstract |
Provided is a polishing composition capable of efficiently reducing haze and surface defects. A polishing composition including a water-soluble polymer (M L-end ) having a hydrophobic region in at least one end of the main chain is provided as a result of the present invention. This hydrophobic region has at least one hydrophobic group derived from a polymerization initiator. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019187969-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019187969-A1 |
priorityDate |
2013-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |