http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015029690-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2014-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab9fd0e67049447b5c4db1f50f5e898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a257f797a65c81c8e72518dad968f85f |
| publicationDate | 2015-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2015029690-A1 |
| titleOfInvention | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film using same, method for manufacturing electronic device, and electronic device |
| abstract | Provided is a pattern forming method which comprises: (I) a step for forming a film using an active light sensitive or radiation sensitive resin composition that contains a compound represented by general formula (1) and a resin having a weight average molecular weight of 11,000 or more and containing a repeating unit having a group that is decomposed by the action of an acid and generates an alcoholic hydroxyl group; (II) a step for exposing the film; and (III) a step for developing the exposed film with use of a developer liquid that contains an organic solvent. This pattern forming method has excellent sensitivity, limiting resolution, roughness characteristics, exposure latitude (EL), temperature dependence of post exposure bake (PEB) and depth of focus (DOF). Also provided are: an active light sensitive or radiation sensitive resin composition which is used in the pattern forming method; a resist film using the active light sensitive or radiation sensitive resin composition; a method for manufacturing an electronic device using the pattern forming method; and an electronic device. In the formula (1), R represents an alkyl group, a cycloalkyl group which may have a carbonyl carbon as a ring member, a lactone structure, a sultone structure, an aryl group or a group that is obtained by combining two or more of the aforementioned groups; and M + represents a monovalent cation. |
| priorityDate | 2013-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.