http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014140370-A1

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filingDate 2014-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2014-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2014140370-A1
titleOfInvention Semiconductor light emitting structure having active region comprising ingan and method of its fabrication
abstract A semiconductor structure includes an active region between a plurality of layers of InGaN. The active region is substantially comprised by InGaN. The plurality of layers of InGaN include at least one well layer comprising ln w Ga 1-w N, and at least one barrier layer comprising In b Ga 1-b N proximate the at least one well layer. In some embodiments, the value of w in the ln w Ga 1-w N of the well layer may be greater than or equal to about 0.10 and less than or equal to about 0.40 in some embodiments, and the value of b in the In b Ga 1- n b N of the at least one barrier layer may be greater than or equal to about 0.01 and less than or equal to about 0.10. Methods of forming semiconductor structures include growing such layers of InGaN to form an active region of a light emitting device, such as an LED. Luminary devices include such LEDs.
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