Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-303 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-302 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26 |
filingDate |
2014-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_134bd9f98bfb5deee9c3e1acccdfc39d |
publicationDate |
2014-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2014132931-A1 |
titleOfInvention |
Active-ray-sensitive or radiation-sensitive resin composition, active-ray-sensitive or radiation-sensitive film, pattern formation method, electronic device, and method for manufacturing electronic device |
abstract |
The present invention provides an active-ray-sensitive or radiation-sensitive resin composition containing: a resin (Aa) containing a repeating unit (c) having at least two groups represented by -COO- in a structure represented by general formula (KA-1) or (KB-1); a resin (Ab) having a repeating unit represented by general formula (A), the solubility of the resin (Ab) with respect to a developing solution being changed by action of an acid; and a compound for generating acid by irradiation with active rays or radiation. |
priorityDate |
2013-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |