| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_527d41cad118be2c39e19a33eab54468 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-549
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2933-0091 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-858
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K77-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K30-87 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 |
| filingDate |
2014-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d77998552bbff4ed7f9e4a822c77326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32456b4808c3830952c74e0b95189c33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b7c0edccaa3e8d2e3b0b13f40022942
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c6ec2fc58ec5941362b54f0fe2b5d3c |
| publicationDate |
2014-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2014123193-A1 |
| titleOfInvention |
Method for manufacturing uneven substrate and light-emitting diode, uneven substrate, light-emitting diode, and organic thin film solar cell |
| abstract |
A method for manufacturing this uneven substrate comprises: a particle arranging step of arranging a plurality of particles (M, M1 to M6) on an original sheet (S); an etching step of using the particles (M) as an etching mask to dry-etch the original sheet (S) and forming an uneven structure on one surface of the original sheet (S); and a removing step of removing the particles (M) remaining on the formed uneven structure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107076877-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I657927-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10444407-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3211458-A4 |
| priorityDate |
2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |