| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-02881
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-2697
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-02818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2033-0095 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01K11-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-2475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-4427
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R31-2831 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N9-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-145 |
| filingDate |
2013-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_526dabee0ecdc58a805bbf241b642657
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9327d1c70da4606611687ba1c5e1874 |
| publicationDate |
2014-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2014074193-A1 |
| titleOfInvention |
Mapping density and temperature of a chip, in situ |
| abstract |
A method and system to map density and temperature of a chip, in situ, is disclosed. The method includes measuring a propagation time that a mechanical propagation wave (100) travels along at least one predefined path (12, 14) in a substrate (10). The method further includes calculating an average substrate density and temperature along the at least one predefined path as a function of the propagation time and distance. The method further includes determining a defect or unauthorized modification (18) in the substrate based on the average substrate density being different than a baseline substrate density. |
| priorityDate |
2012-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |