http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014069859-A1

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publicationDate 2014-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2014069859-A1
titleOfInvention Epitaxial wafer and method for manufacturing same
abstract Provided is a method for manufacturing an epitaxial wafer, and the method comprises: a preliminarily growing step of growing an epitaxial layer up to a designated first thickness by a designated first growth speed at a designated first growth temperature by injecting a reaction source for epitaxial growth on a semiconductor wafer arranged within a chamber; a heat treatment step of performing heat treatment for the preliminarily grown epitaxial layer for a predetermined time; and a subsequent growing step of growing the epitaxial layer up to a target thickness by a designated second growth speed at a designated second growth temperature by injecting the reaction source on the thermally treated semiconductor wafer, wherein the first growth speed is slower than the second growth speed.
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