Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e40ceab05afbe887909abf7467edd987 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2995-0018 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2995-0093 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2059-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2031-7562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2011-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0153 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B21D31-005 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B21D31-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C99-0025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3878 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-424 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-42 |
filingDate |
2013-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61b7ae911d563ba07a727be47360f2a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_052c7e796ad3a53ab7c4915f34768c63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f33050a73ecaa4aaffd2b2c32d5379a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88a520e1a4bee15d15045ad26c5582b1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d096e4305215d5c3f00b967ef102bef0 |
publicationDate |
2014-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2014052777-A1 |
titleOfInvention |
Methods and systems for fast imprinting of nanometer scale features in a workpiece |
abstract |
The subject matter described herein relates to methods and systems for fast imprinting of nanometer scale features in a workpiece. According to one aspect, a system for producing nanometer scale features in a workpiece is disclosed. The system includes a die having a surface with at least one nanometer scale feature located thereon. A first actuator moves the die with respect to the workpiece such that the at least one nanometer scale feature impacts the workpiece and imprints a corresponding at least one nanometer scale feature in the workpiece. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109790639-A |
priorityDate |
2012-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |