| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_62fdba7df52864f2aeb98ddce78d9a12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823871
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-16 |
| filingDate |
2013-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_255d30a2687b96168380881de9b2239e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fc328835b05fbd8fde71ecbc6767577
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_532416b23aebb3f9894bb97e93216366 |
| publicationDate |
2014-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2014039186-A1 |
| titleOfInvention |
Etching composition |
| abstract |
This disclosure relates to an etching composition containing about 60 % to about 95 % of at least one sulfonic acid; about 0.005 % to about 0.04 % of chloride anion; about 0.03 % to about 0.27 % of bromide anion; about 0.1 % to about 20 % of nitrate or nitrosyl ion; and about 3 % to about 37 % of water. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10485757-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11633350-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2847364-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11426345-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10568975-B2 |
| priorityDate |
2012-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |