http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014026631-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cd64bb66e9a50bbc5e8b607c75bfa5ca |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B21B37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B21B1-26 |
| filingDate | 2013-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5ec8419644fb5044ede655d855c0fb2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9ad8a9fcc12f2060981d83cf3dc8cff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64106c0743fe7dc3ddc6020909e27291 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78c062f42cbd99ea7a3356125ba39bad http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb64301bd35208ee9f01afee950fb31b |
| publicationDate | 2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2014026631-A1 |
| titleOfInvention | Hot rolling process for high-performance tantalum target |
| abstract | Provided is a hot rolling process for a high-performance tantalum target. The method comprises: preheating first a forged blank to 900-1,200 °C; then rolling; and performing acid cleaning till tantalum metal luster occurs without mottles. A high-performance tantalum target which comprises uniform and consistent texture components with textures along the thickness direction (110) of the target predominant and meets the use requirements of a high-end sputtering base can be obtained by using a high-performance tantalum target rolling blank produced by heating and rolling. Compared with an ordinary tantalum target, the high-performance tantalum target not only achieves texture components with textures along the thickness direction (110) of the target predominant, but also meets higher requirements on the uniformity of the textures, and therefore a consistent sputtering rate during using is ensured. |
| priorityDate | 2012-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.