http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013168546-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-852 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-35 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-81 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-816 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-173 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 |
| filingDate | 2013-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bda49e8649ebd642718fea52c614f2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67910d0fff03ecf044d21d26b9cc6660 |
| publicationDate | 2013-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2013168546-A1 |
| titleOfInvention | Process for producing display device |
| abstract | A process for producing a display device is provided in which a thin organic film layer can be formed in an even thickness without requiring an oxygen plasma treatment, etc. The process is a process for producing a display device which comprises a supporting substrate, partition walls, and a plurality of organic EL elements and in which the organic EL elements each comprises a first electrode, a thin organic film layer, and a second electrode in this order from the supporting substrate side, the process comprising: a step in which a supporting substrate is prepared on which partition walls pattern-wise formed by photolithography from a photosensitive resin composition containing a liquid repellent and a first electrode have been disposed; a step in which the surface of the first electrode is cleaned with a solution containing at least any one of oxalic acid, phosphoric acid, acetic acid, nitric acid, and hydrogen chloride or with a developing solution for the photosensitive resin composition; a step in which a thin organic film layer is formed on the first electrode through coating fluid application; and a step in which a second electrode is formed on the thin organic film layer. |
| priorityDate | 2012-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 121.