| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate |
2013-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8480941479d47c204fa40dcbe910dc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_396d61f1c5f8fbc8129fce9dafb1350e |
| publicationDate |
2013-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2013141222-A1 |
| titleOfInvention |
Resist pattern forming method and photoresist composition |
| abstract |
The present invention is a resist pattern forming method comprising a step for forming a resist film using a photoresist composition, a step for exposing the resist film, and a step for developing the exposed resist film, the photoresist composition containing: an acid generator that generates a protonic acid when irradiated with exposure light; and a polymer that has a structural unit which contains a group (a) that forms a cationic group together with a proton, but does not substantially have a structural unit that contains an acid-cleavable group. It is preferable that the group (a) contains at least one atom that is selected from the group consisting of a nitrogen atom having an unshared electron pair and a phosphorus atom having an unshared electron pair. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017009868-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10012902-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014032407-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170098186-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102586524-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017146521-A |
| priorityDate |
2012-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |