| abstract |
The invention relates to a method for coating a substrate (10) with an AlO x layer (12), in particular an Al 2 O 3 layer, said method comprising the following method steps: (a) providing an inductively coupled plasma source (ICP source) (20) having a reaction chamber (22) and at least one RF inductor (24), (b) introducing an aluminium compound, preferably trimethyl aluminium (TMA), into the ICP source, (c) introducing oxygen and/or an oxygen compound as a reactive gas into the ICP source and inductively coupling energy into the ICP source to form a plasma (30), and (d) depositing the AlO x layer on the substrate. The invention also relates to a coating installation for depositing thin layers on a substrate, in particular for carrying out the above method. The coating installation comprises an inductively coupled plasma source (ICP) (20) having a reaction chamber (22) and at least one RF inductor (24), a substrate holder for arranging the substrate in the reaction chamber and channels (26, 28) for introducing the aluminium compound and a reactive gas into the ICP source. The substrate is arranged in the reaction chamber in such a way that the surface to be coated of the substrate is facing the ICP source. |