| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_781c429e4e20536916ff74dcbe1b5417 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-721
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-9661
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-9646
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-442 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-645
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2012-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3345815900815f72ed740648db230449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65c690b24b37522a580735592d5680b7 |
| publicationDate |
2013-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2013099832-A1 |
| titleOfInvention |
Sintered magnesium oxide target for sputtering, and method for producing same |
| abstract |
A sintered magnesium oxide target for sputtering, characterized by having a purity excluding C of 99.99 wt% or more, a density of 3.57 g/cm 3 or more and a degree of whiteness of 60% or less. For the purpose of forming a film of magnesium oxide uniformly, a magnesium oxide target having a higher purity and a higher density has been demanded. The purpose of the present invention is to provide a target which can realize the magnesium oxide target and a method for producing the target. A sintered magnesium oxide sputtering target is produced by hot-pressing a raw material powder. However, in the production, there is a problem that unevenness in color occurs in a ca . φ60 region (i.e., a region that is the interior of a circle having a diameter of 60 mm) located at the center of the target. Although attention has not been focused on the problem particularly heretofore, it is needed recently to overcome the problem for the purpose of improving the quality of films and therefore it is needed to find a means for solving the problem. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11676632-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020054104-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7108046-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018193598-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111465712-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021201947-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020054104-A1 |
| priorityDate |
2011-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |