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filingDate 2012-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d901ef23866a83cfea947fb91ae6cb0c
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publicationDate 2013-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2013084795-A1
titleOfInvention Complex oxide sintered body, sputtering target, transparent conductive oxide film, and method for producing same
abstract The present invention provides a complex oxide sintered body (10) wherein if indium, zirconium and yttrium are respectively In, Zr and Y, Zr/(In + Zr + Y) is 0.05-4.5 at% and Y/(In + Zr + Y) is 0.005-0.5 at%. The present invention also provides a sputtering target which is formed of the complex oxide sintered body (10) and a transparent conductive oxide film which is obtained by sputtering the sputtering target.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015187062-A
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