| abstract |
The invention relates to a porous, nanostructured layer system comprising a carrier material that has a substrate onto which one or more layers can optionally be applied, and there being, on said carrier material, at least one first porous layer AL1 which comprises gaps, which is obtained by plasma-enhanced chemical vapour deposition (PECVD), and which comprises agglomerates that are spaced apart and broaden towards the top in at least some sections. As a result of these spaced agglomerates, this porous PECVD agglomerate layer AL1 containing gaps has an average gap width <d 1 > ranging from 3 to 500 nm, determined on a scanning electron micrograph in plan view. |