http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013037197-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc1f134aa07a8886528f9d4bb5ff349d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_84e2597dc26f5e18582bdcaa379db9ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a392e2f7c79d0fb0792263326edbad57 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9500e3f1f105215852473d57fd015ae3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b4711b7defc1422cdb7f86d2c95657bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_43643b8b24f0d92553b0e55abf9660fc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0085 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 |
| filingDate | 2012-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af662daa498e5b882133335d88bf1998 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68c77cee1179dc3d96678aee3a4ae1a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa4cf32dfd183365f34132c930bba974 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6067f1fac419cdd0717f12bbd77da449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2822f9602c48b3505a0da187a2dddb8 |
| publicationDate | 2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2013037197-A1 |
| titleOfInvention | Photosensitive benzocyclobutene resin composition and preparation method and patterning method thereof |
| abstract | A kind of photosensitive benzocyclobutene resin composition having good heat resistance and film forming property is provided, which comprises benzocyclobutene resin, photosensitizer and organic solvent; The preparation method for the composition is as following: adding benzocyclobutene resin into organic solvent, stirring the mixture for dissolving completely, then adding photosensitizer into the mixed solution, agitating the mixture under UV shielding condition to obtain the negative photosensitive benzocyclobutene resin composition. The preparation method is simple and convenient. Also disclosed is the patterning method for the resin composition, spin coating the photosensitive benzocyclobutene resin composition on a film coating substrate, then sequently undertaking pre-baking, exposing, developing and curing, so as to obtain a patterned photosensitive benzocyclobutene resin with mechanical strength. The patterning method requires no use of photoresist, is simple and convenient, and reduces the cost effectively. |
| priorityDate | 2011-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.