http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013003991-A8
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_523a7ebda883ab730bce9052af1ee2cd http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_185d8ad020a8c65cb34e37646a8e2a1a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7b2eab0979d9932181b5b6e0a26e5c39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b4711b7defc1422cdb7f86d2c95657bf |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate | 2011-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e775a88ef6fbcd6a9a18954ea76e6fd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f65d227d22e788089a111b23887e6012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d802dc36bf569e9405440c9b0e0f8be8 |
| publicationDate | 2013-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2013003991-A8 |
| titleOfInvention | Polishing liquid for polishing process based on metal co and use thereof |
| abstract | Disclosed is a polishing liquid for a polishing process based on metal Co and the use thereof. The polishing liquid components comprise the following raw materials by weight percent: 0.01-2% of inhibitor, 0-5% of oxidant, 0.1-10% of grinding particle, 0.001-10% of chelating agent and the balance being water; the above raw materials are regulated by a pH-value regulating agent until the pH-value of the polishing liquid reaches 3-5; the inhibitor is selected from more than one of five-membered heterocyclic derivatives containing S or N or containing both S and N; the oxidant is selected from more than one of hydrogen peroxide, ammonium persulphate, potassium periodate and potassium perchlorate; the grinding particle is selected from more than one of silicon dioxide, cerium dioxide and aluminum oxide; and the chelating agent is selected from amino acid or citric acid or the mixture thereof. The polishing liquid of the present invention can effectively inhibit the static corrosion of the metal Co, reduce the polishing rate of the metal Co, and prevent the metal Co from over-corrosion during polishing. |
| priorityDate | 2011-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.