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filingDate 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2012177716-A2
titleOfInvention N-metal film deposition with initiation layer
abstract Provided are methods of depositing N-Metals onto a substrate. Methods include first depositing an initiation layer. The initiation layer may comprise or consist of cobalt, tantalum, nickel, titanium or TaAIC. These initiation layers can be used to deposit TaC x .
priorityDate 2011-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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