abstract |
This invention is a method for manufacturing a molybdenum oxide-containing thin film, wherein a starting material for forming a thin film containing a compound represented by general formula (I) is vaporized, the vapor containing the resulting molybdenum amide compound is introduced onto a substrate, and an oxidized gas is introduced so as to cause a decomposition reaction and/or a chemical reaction and form a thin film on the substrate. In the formula, R 1 and R 2 represent C 1- n 4 linear or branched-chain alkyl groups, R 3 represents a t-butyl group or a t-amyl group, y represents 0 or 2, x is 4 when y is 0 and x is 2 when y is 2, and a plurality of R 1 , R 2 may be the same or different. |