| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c32f8b62a74bc1f3d8e8014ba0880924
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01e48e78fadaaec045333f9ad5a6e0b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_84047516728e08008bcf72d75e3268b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38e037aa2cdf1e7e8bec97e66393f7d4 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2012-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19555660edbb64f7cb72e5c43c5612e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d88eb2fa7ca821ac8aabf2c659f730e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f38cd762e1acfb229086557e94b8854f |
| publicationDate |
2012-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2012142126-A2 |
| titleOfInvention |
Method of making radiation-sensitive sol-gel materials |
| abstract |
Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a base generator dispersed or dissolved in a solvent system. The sol-gel compound comprises recurring monomeric units comprising silicon with crosslinkable moieties bonded to the silicon. Upon exposure to radiation, the base generator generates a strong base, which crosslinks the sol-gel compound in the compositions to yield a crosslinked layer that is insoluble in developers or solvents. The unexposed portions of the layer can be removed to yield a patterned sol-gel layer. The invention can be used to form patterns from sol-gel materials comprising features having feature sizes of less than about 1 m. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107848963-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107848963-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015111640-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019238460-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3582004-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10100070-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015111640-A1 |
| priorityDate |
2011-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |