| abstract |
[Problem] To provide a material whereby a photosensitive composition can be applied to a substrate and dried to form a photosensitive coating, and a pattern can be formed by exposure and development, and to provide a method for patterning the material. [Solution] A photosensitive composition comprising water-soluble organic particles and a solvent, the solvent being a poor solvent with respect to the water-soluble organic particles. The photosensitive composition is preferably configured such that the water-soluble organic particles comprise a polymer containing a unit structure (A) for forming organic particles, a unit structure (B) for forming cross-linkages between particles, and a unit structure (C) for imparting dispersibility, and the composition further includes a photoacid generator. The photosensitive composition may alternatively be configured such that the water-soluble organic particles comprise a polymer containing a unit structure (A) for forming organic particles, a unit structure (B) for forming cross-linkages between particles, a unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. The pattern formation method comprises the steps of applying the photosensitive composition to a substrate and drying the photosensitive composition to form a photosensitive coating, exposing the coating via a mask, and developing using a developing solution. |