http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012135342-A1

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filingDate 2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a091329f023fd3c53e9f10104fbfbb77
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publicationDate 2012-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2012135342-A1
titleOfInvention Chemical mechanical polishing of group iii-nitride surfaces
abstract A method of chemically-mechanically polishing a substrate having a Group Ill-nitride surface includes providing a chemical-mechanical polishing slurry composition. The slurry composition includes a slurry solution including a liquid carrier and an oxidizer including a transition metal or a per-based compound. The slurry solution includes at least one component that reacts with the Group Ill-nitride surface to form a softened Group Ill-nitride surface. The Group Ill-nitride comprising surface is contacted with the slurry composition by a pad to form the softened Group Ill-nitride surface. The pad is moved relative to the softened Group Ill-nitride surface, wherein at least a portion of the softened Group Ill-nitride surface is removed.
priorityDate 2011-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 29.