http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012133956-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
filingDate 2012-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d3e7f05491bf6da76e4092638c7353b
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publicationDate 2012-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2012133956-A1
titleOfInvention Method for producing molds
abstract [Objective] To enable improvements in throughput in production of molds having deposited films as mold release layers. [Constitution] In production of a mold 1 having a deposited film on the surface thereof as a mold release layer (14), a quartz substrate (10) is plasma etched employing an etching gas that includes a sedimentary gas (5a)/(5b) to form a pattern of protrusions and recesses having a desired shape in a structure constituted by the quartz substrate (10) and a mask layer (M), while a deposited film constituted by sediment of the sedimentary gas (5a)/(5b) is formed along the pattern of protrusions and recesses.
priorityDate 2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 27.