Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed89ca88042d3b6f7afc21d7b6dd7b87 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88928d7edd33d28f770fbabb61ff8a55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bdabbb689c4e551589a998a701fb4458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f495daac5788a8a7aa312cf78afd8d1a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31155 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-22 |
filingDate |
2012-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_913838d90ee25ac0ba05645bd3d92d5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4804e8fa6e24264011237f66c0d3300d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ff15c31256dae1171b64565dc7005ec |
publicationDate |
2012-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2012116044-A1 |
titleOfInvention |
Ion-assisted plasma treatment of a three-dimensional structure |
abstract |
A boundary between a plasma and a plasma sheath is controlled such that a portion of the shape is not parallel to a plane defined by a front surface of the workpiece facing the plasma. Ions in the plasma are directed toward the workpiece. These ions can either seal pores or clean a material from a structure on the workpiece. This structure may, for example, have multiple sidewalls. A process that both cleans a material and seals pores in the structure may be performed. |
priorityDate |
2011-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |