http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012111656-A1

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filingDate 2012-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b4e7998dee491a2c7788136b994b553
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publicationDate 2012-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2012111656-A1
titleOfInvention Curable composition for nanoimprinting, nanoimprinting compact, and pattern forming method
abstract The present invention provides a curable composition that is to be used in nanoimprinting for transcribing minute recess/protrusion patterns by pressing a nanoimprinting mold, said curable composition comprising composite resin further comprising: polysiloxane segments having a silanol group and/or a hydrolyzable silyl group, and a polymerizable double bond; and polymer segments other than polysiloxane. The present invention also provides a nanoimprinting compact, a resist film, a resin mold, and a pattern forming method using the nanoimprinting composition.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170081163-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6090547-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014061630-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014061630-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7357882-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013225625-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016108458-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10197916-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102443876-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016072202-A1
priorityDate 2011-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 41.