| abstract |
[Problem] To provide an imprint material capable of forming a film which exhibits high scratch resistance even after a pattern has been transferred thereto, specifically, an imprint material capable of forming a film such that, when the film is patterned by transferring and then subjected to a steel wool scratch test, few scratch marks are observed. [Solution] An imprint material which comprises (A) a compound that has at least one ethylene oxide unit and at least one polymerizable group, (B) a urethane compound that has at least one long-chain alkyl group having 13 to 25 carbon atoms and at least one polymerizable group and that is modified with polycaprolactone, and (C) a photopolymerization initiator. |