| abstract |
The present invention relates to a method of manufacturing a patterned phase delay film, and more particularly, to a method of manufacturing a patterned phase delay film in which light curable monomer composition layers are formed at a predetermined distance and cured to form a patterned phase delay film, and a patterned phase delay film manufactured by the above-described method. According to the present invention, a board already capable of performing phase delay is utilized, and light curable monomer composition layers are formed at a predetermined distance and cured. Thus, a process for forming an orientation material layer and an orientation to the orientation material layer may be performed only once to form a patterned orientation. Thus, the number of manufacturing processes may be significantly reduced. As a result, manufacturing costs may be reduced. Thus, a phase delay film on which a more precise pattern is formed may be manufactured. Also, when directly rubbing on the board having the phase delay function to form the orientation, it may be unnecessary to form the orientation material layer. Thus, the number of manufacturing processes may be further reduced, and also, a height difference between the light curable monomer composition layer and the board may be reduced. |