Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_59e5c0495d461f25cc7dbef12aba9a9b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f74c80ed6f17d7634a412abe9d80166 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01e48e78fadaaec045333f9ad5a6e0b5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2d60acc7e06948fbc149256b91cdab12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_84047516728e08008bcf72d75e3268b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c32f8b62a74bc1f3d8e8014ba0880924 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e4262bfff4555a3a1b5a7a3f34b0da7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_57de93262157b0fc1067a13999880347 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24612 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0338 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2011-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75c71e5b9c6e7b460ed46c2f94d263e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d14945ea9990a1beaf091660a8e4add http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73e1ad88bc2f6c0fc1a0e3866b9e8152 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_baacd10aefb0a53445856b2e1857637f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76587146325983c7ffa6b484b1cd97ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb3ce4c6cb1bb65edada0f102fc5998a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cc919a2906bd7c2251d9497f0d25491 |
publicationDate |
2012-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2012092139-A2 |
titleOfInvention |
Processes to pattern small features for advanced patterning needs |
abstract |
Methods of forming microelectronic structure are provided. The methods comprise the formation of T-shaped structures using a controlled undercutting process, and the deposition of a selectively etchable composition into the undercut areas of the T-shaped structures. The T-shaped structures are subsequently removed to yield extremely small undercut-formed features that conform to the width and optionally the height of the undercut areas of the T-shaped structures. These methods can be combined with other conventional patterning methods to create structures having extremely small feature sizes regardless of the wavelength of light used for patterning. |
priorityDate |
2010-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |