| abstract |
The present invention provides a composition for forming a coating-type insulating film with which an insulating film having excellent high heat resistance, transparency in the visible light region, a low dielectric constant and flexibility can be formed. The present invention is a fluorine-containing composition for forming a coating-type insulating film, which is characterized by comprising an organic silicon compound (A), and a fluorine-containing polymer (B) having the structural units represented by formula (L). (In the formula, X 1 and X 2 are the same or different, and are H or F; X 3 is H, F, CH 3 or CF 3 ; X 4 and X 5 are the same or different, and are H, F or CF 3 ; Rf is a fluorine-containing hydrocarbon group with 1-40 carbons optionally having an amide linkage or urea linkage, or is a fluorine-containing hydrocarbon group having an ether linkage with 2 to 100 carbons, and optionally having an amide linkage, a carbonate linkage, a urethane linkage or a urea linkage, wherein 1 to 3 locations of the terminal structure are substituted by Y (Y is a monovalent organic group containing at least one hydrolyzable metal alkoxide region with 1 to 50 carbons on the terminal, or a monovalent organic group with 2 to 10 carbons having an ethylenic carbon-carbon double bond on the terminal); a is an integer from 0 to 3; b and c are the same or different, and are 0 or 1.) |