| abstract |
The present invention relates to a texture-etchant composition for a crystalline silicon wafer to form a micro-pyramidal structure that can maximize the light absorption on the surface of the crystalline silicon, and a method for etching the crystalline silicon wafer using same, in a crystalline silicon wafer texture-etching composition comprising (A) an alkali compound, (B) a cyclic compound having a boiling point of 100℃ or above,(C) a compound having silica, and (D) water, and a method for etching a crystalline silicon wafer using same. |