http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012002150-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cdd94f212dc7aef02fc1dcf28fa9b4fd http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7dcf147118b57c84fe7235d3999bd2c5 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-844 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-145 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-04 |
| filingDate | 2011-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed1675e1c1f796c02a04972397e55801 |
| publicationDate | 2012-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2012002150-A1 |
| titleOfInvention | Gas barrier film and gas barrier film formation method |
| abstract | Disclosed is a gas barrier formation method which, without heat treating a coating film formed by applying a coating liquid containing polysilazanes, has high gas barrier performance achieved by an extremely quick modification treatment of a few seconds; also disclosed is a gas barrier film. In the disclosed gas barrier film formation method, a discharge gas containing an inert gas is supplied to the surface of a coating film formed by coating a substrate with a coating liquid containing polysilazanes. Plasma formed in a discharge space to which a high frequency electric field is applied, or light emitted from said plasma, is irradiated onto the surface of the aforementioned coating film to modify the same and to form a gas barrier film. The aforementioned discharge gas contains at least a carbon dioxide gas or carbon monoxide gas, the content thereof being between 0.01 volume% and 3.0 volume%, and the frequency of the aforementioned high frequency electric field is in the microwave range between 300 and 30,000 MHz. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014061617-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014061617-A1 |
| priorityDate | 2010-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.