http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011152058-A1

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filingDate 2011-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85f292545a8dbe844d02bcd4d6783534
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publicationDate 2011-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2011152058-A1
titleOfInvention Photosensitive resin composition, and method for producing photosensitive resin composition
abstract Disclosed is a method for producing a photosensitive resin composition containing at least an alkali-soluble resin (A), a photoacid generator (B), a surfactant (C), and an organic solvent (D), wherein said method involves a step for obtaining a dispersion liquid which contains the surfactant (C) and the organic solvent (D) and which does not contain the alkali-soluble resin (A) and the photoacid generator (B), and a step for adding the alkali-soluble resin (A) and the photoacid generator (B) to said dispersion liquid.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3974904-A1
priorityDate 2010-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 31.