| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eaffc28ed4f5cef350ed0672e2d39ec0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cb5c617da1c377876323e1d8d298fe41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d6f7da1e425c8a3ef1da21e08f4c196 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L3-502753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L3-502707
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2325-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0015
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D39-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D39-1692
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D39-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D69-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D67-00 |
| filingDate |
2010-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c4358a6a4dcdfd09a3fac08445adfe2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3193c326569ac8506ffd5730fb08396f |
| publicationDate |
2011-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2011142788-A2 |
| titleOfInvention |
Microscopically structured polymer monoliths and fabrication methods |
| abstract |
Novel polymer monolith structures and methods for fabrication of the same are disclosed in a variety of embodiments. In an illustrative embodiment, a method includes forming a pattern of features on a wafer, thereby forming a patterned wafer; forming a polymer layer on the patterned wafer; using a first plasma to remove at least a portion of the polymer layer; and using a second plasma to etch off at least a portion of the pattern of features, thereby providing a structured polymer monolith. The pattern of features may include an array of pillars. Providing the structured polymer monolith may include providing a structured polymer monolith filter having an array of channels formed by the pillars. The structured polymer monolith may be composed of polypropylene. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104056556-A |
| priorityDate |
2009-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |