| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_743cebf18a5ebaa35ec8998973f691eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ff8c89d66f738562d0e972d0a3634b9a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc3e639586089fe232d0cfb27383c875 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T50-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3417
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3447
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3435
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N50-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L43-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L43-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2011-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2563d15dad826c67c654c33525cb492c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aafc35ed0c1f5426d1c9e646522114c9 |
| publicationDate |
2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2011122411-A1 |
| titleOfInvention |
Sputtering device |
| abstract |
Disclosed is a sputtering device provided with a substrate stage (14), which rotates a substrate (S) having a surface on which a film is to be formed, in a vacuum vessel (11). A target (TA) that has a sputtering surface (TAs) formed from magnesium oxide is provided in a circumferential direction from the substrate (S). When the angle formed by the normal line (Ls) to the substrate and the normal line (Lt) to the target is described as the angle of inclination θ for the target (TA), the target (TA) is disposed such that the angle of inclination θ satisfies 50 + φ < θ < -35 + φ. Here, φ is an angle represented by φ = arctan(W/H); H represents the height from the center of the substrate (S) to the center of the target (TA); and W represents the width from the center of the substrate (S) to the center of the target (TA). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015096881-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014116059-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5836485-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10361363-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013082961-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6095806-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015121905-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9449800-B2 |
| priorityDate |
2010-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |