http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011121903-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_14df928cce1112b89356928855b60351 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_faea3f68ba3a309e7dc5410085130c8f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-315 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08C19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-73921 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-083 |
| filingDate | 2011-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a0980e4e9f11279f85ce9cff0514aa7 |
| publicationDate | 2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2011121903-A1 |
| titleOfInvention | Method for producing glass substrate for information recording medium |
| abstract | When repeatedly using colloidal silica as a polishing material when subjecting a glass material containing cerium oxide in the composition thereof to precision polishing, a limitation on the frequency in which the colloidal silica can be repeatedly used is removed, thereby being able to dramatically increase productivity. Disclosed is a method for producing a glass substrate for an information recording medium, which involves: a rough polishing step in which a glass material containing 0.01 to 2 mass% of cerium oxide is roughly polished; a washing step in which the glass material after being subjected to the rough polishing step is washed so that the cerium content at the surface of the glass material is reduced to 0.125ng/cm 3 or less; and a precision polishing step in which the glass material after being subjected to the washing step is subjected to precision polishing by repeatedly using a polishing material containing colloidal silica. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014083598-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014083597-A |
| priorityDate | 2010-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.