| abstract |
A resist which exhibits improved water repellency, solvent solubility and developer solubility can be obtained by using, as the resist material, a polymeric compound which contains a structural unit formed by polymerization of a fluorine-containing lactone monomeric compound represented by general formula (1). Further, an extremely fine and high-accuracy pattern shape can be attained by using a topcoating fluid containing the polymeric compound. In general formula (1), R 1 , R 2 , R 3 and R 4 are each independently hydrogen, C 1-6 linear alkyl, C 3-6 branched alkyl, or C 3-6 cyclic alkyl; R 5 is hydrogen, fluorine, optionally fluorinated C 1-6 linear alkyl, C 3-6 branched alkyl, or C 3-6 cyclic alkyl; and R f is C 1-4 linear perfluoroalkyl. |