http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011104850-A1

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filingDate 2010-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2011-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2011104850-A1
titleOfInvention Semiconductor device and production method therefor
abstract In order to improve IGBT characteristics, in particular to reduce steady loss, turn-off time, and turn-off loss, an IGBT is provided with a base layer (2), a buried insulating film (3) having open sections (5), a surface semiconductor layer (4) that is connected to the base layer (2) below the open sections (5), a p-type channel formation layer (7) that has been formed in the surface semiconductor layer, an n+-type source layer (8), a p+-type emitter layer (9), gate electrodes (11) that have been formed upon the surface semiconductor layer (4) with a gate insulating film (10) therebetween, an n+-type buffer layer (18), a p-type collector layer (19), and the like, wherein the thickness of the surface semiconductor layer (4) is about 20 nm to 100 nm.
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