| abstract |
The invention relates to a method for coating a substrate with aluminum-doped zinc oxide, comprising the steps of generating a nucleation coating between 5 nm and 400 nm thick, comprising zinc oxide or doped, in particular aluminum-doped zinc oxide, on the surface of the substrate by atomizing a solid target; generating a quasi-epitaxially propagating top coating comprising aluminum-doped zinc oxide on the nucleation coating; and wet chemically etching the top coating. |