| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de8272e6e15218b498842254279b276e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99e1f4a9adecd6fda30475c6b847d669
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_706d909f2118265a868a11b9c005121e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1832
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0296
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14649
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14689 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0296 |
| filingDate |
2010-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_788951be96e505d45673da78fef2ca99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b43481c1188d59756ed012061104f789 |
| publicationDate |
2011-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2011067058-A1 |
| titleOfInvention |
Infra red detectors and methods of manufacture |
| abstract |
A method of forming infra red detector arrays is described, starting with the manufacture of a wafer. The wafer is formed from a GaAs or GaAs/Si substrate having CMT deposited thereon by MOVPE. The CMT deposited comprises a number of layers of differing composition, the composition being controlled during the MOVPE process and being dependent on the thickness of the layer deposited. Other layers are positioned between the active CMT layers and the substrate. A CdTe buffer layer aids the deposition of the CMT on the substrate and an etch stop layer is also provided. Once the wafer is formed, the buffer layer, the etch stop layer and all intervening layers are etched away leaving a wafer suitable for further processing into an infra red detector. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11764325-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11482638-B2 |
| priorityDate |
2009-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |