Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2b4169fe678a84350eb46b3516c4e41c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e2665ba0e254d53d53617e0e6db56554 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b1e2c846236d6f8ed9db34f7c4196b11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26828a7eaa10755e15e8498759e41017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_780f209c5e60e0d348abf708496c4437 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-606 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F23J2219-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-404 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F23J15-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-504 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-77 |
filingDate |
2010-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1210184ae9cdbc0e8551309abe27aa86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c917df3b28cc616b0f2bd99af4bbca66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0ceaea935b0e5e11c0aa5e81adb9849 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4685e442be470327be86f7622d2d3978 |
publicationDate |
2011-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2011052478-A1 |
titleOfInvention |
Exhaust gas treatment apparatus |
abstract |
Disclosed is an exhaust gas treatment apparatus, the structure whereof being simplified such that the the dissolved oxygen concentration and pH level in the froth layer may be kept within prescribed ranges while greatly reducing the number of gas risers. The exhaust gas treatment apparatus has a sealed vessel (21). The sealed vessel (21) is vertically partitioned by a partition (22) into two spaces. The space below the partition (22) serves as an absorbent liquid storage unit (24), and the space above the partition (22) serves as an exhaust gas introduction unit (26). A gas riser (30) is disposed upon the partition (22) to discharge the treated exhaust gas from the upper space (24a) of the absorbent liquid storage unit (24). A plurality of sparger pipes (29) are disposed upon the effective region where the gas riser (30) is not disposed the partition (22), to be inserted into the absorbent liquid stored in the absorbent liquid storage unit (24). A non-eject area is disposed in the effective region wherein no sparger pipes (29) are disposed. No froth layer is formed upon the non-eject region, and the absorbent liquid containing bubbles from the surrounding froth layer flows downward, causing the absorbent liquid to circulate. |
priorityDate |
2009-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |