| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c08dead76ddfa2318058ed43be4d78ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2707056d594790a62947ee030653e6f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7abdfafb760ba2bfc84ff5c6d69df05a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e9f40ae29d4d7198b1cfa3bea989927a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2010-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3d95c676050819ffac650a0a2afa313
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0828b380704582f63b9270e895b5243
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_184e36cfea7f110ded18dbe74782f4d6 |
| publicationDate |
2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2011040749-A2 |
| titleOfInvention |
Dry film photoresist |
| abstract |
The present invention relates to a dry film photoresist, and more particularly to a dry film photoresist which can improve resolution by performing an exposure process in a removed state of a supporting film to prevent bad influence of an exposure effect due to the supporting film. In addition, the high resolution can be obtained by preventing the lowering of the transparency or the reduction of the developing speed while the exposure process is performed in presence of a resin protection layer. Particularly, the resin protection layer according to the present invention can reduce the manufacturing cost and the haze by reducing the wetting agent content such as polysilicon, can prevent the lowering of the haze by suppressing the damage of the resin protection layer, and can obtain the high resolution by preventing the reduction of the developing duration. |
| priorityDate |
2009-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |