| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8ec4875c5098c40cb3d33f2181c228ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3d0d7c049901f0caf03f28a19c7a6bba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9c90c416e70aa46b76fe9483ba1cb86a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5cef03af1338740beede8dd6180e3a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_74c14d1eedbf5f676317f306a2765d02 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0684 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 |
| filingDate |
2010-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a96cc62c92cff754d569499804664e94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7f66afd33de706db372b406ca6b4669
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f87394049e4c4594a736bb76cc3984fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74148a44736014fba64b46c0a70fab82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21665649fe77d3d839065a176d476e9f |
| publicationDate |
2011-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2011032629-A1 |
| titleOfInvention |
Ink jet printable etching inks and associated process |
| abstract |
The present invention refers to a method for contactless deposition of new etching compositions onto surfaces of semiconductor devices as well as to the subsequent etching of functional layers being located on top of these semiconductor devices. Said functional layers may serve as surface passivation layers and/or anti-reflective coatings (ARCs). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2743969-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2743969-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103733357-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013060409-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2587564-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9379326-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103907216-A |
| priorityDate |
2009-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |