| abstract |
The present invention relates to an aqueous cleaning solution composition for removing the contaminant formed in a channel portion of a thin film transition during a manufacturing process of a flat panel display (FPD), and a cleaning method using the same. The aqueous cleaning solution composition of the present invention has an excellent cleaning power against an organic contaminant, a metal-resist deposit, a metal oxide and a metal complex formed in a channel portion of a thin film transition, and also has excellent corrosion prevention of a metal interconnect formed on a substrate, particularly copper and copper alloy interconnects, and an insulating film. In addition, the aqueous cleaning solution composition of the present invention contains a large amount of deionized water and thus can be easily handled and is environmentally advantageous. |