http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011025288-A1

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filingDate 2010-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07a06edff5bc0c5c313e72c1ab744795
publicationDate 2011-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2011025288-A1
titleOfInvention Resistive heating device for fabrication of nanostructures
abstract The disclosed invention relates to apparatuses and techniques for a resistive heating device. The heating device may include a substrate, at least one electrically-conductive elongated structure disposed on the substrate, the at least one electrically-conductive elongated structure including at least one resistive portion having a conductivity lower than tha of the remaining portions of the at least one electrically-conductive elongated structure, and at least one heat- conductive column disposed on the at least one resistive portion of the at least one electrically-conductive elongated structure.
priorityDate 2009-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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