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publicationDate 2010-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2010122985-A1
titleOfInvention Polishing liquid for semiconductor substrate and method for polishing semiconductor substrate
abstract Disclosed is a polishing liquid for a semiconductor substrate, which contains polishing particles, 1,2,4-triazole and a basic compound. The basic compound is a nitrogen-containing basic compound or an inorganic basic compound, and is contained in the polishing liquid in an amount of not less than 0.1% by mass. The basic compound has a pH of not less than 9 but not more than 12.
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