| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e0bf0928b608797b70bbc2b91c7e52e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f687324cf465e3729f8d1bb300e6cf27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_676173856abe5f613ca983def27743d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_97fb5c24914342cdb3136d6455df3beb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5425061b2217b88a285475a22cc82d2d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2010-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37b4f65e5d532a9f2d4d6dddc95de650
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e5a60ed86ff309baf70b1129f10484b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cedc1338377fa62ed14d26a29c3d664f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7a430cffb7cf0ef5885da7579aba899 |
| publicationDate |
2010-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2010118916-A1 |
| titleOfInvention |
Organic photoresist stripper composition |
| abstract |
The present invention relates to aphotoresist stripper composition, comprising a polar organic solvent, a basic primary or secondary alkanolamine compound or a combination thereof, a tertiaryaminecompound, and an inhibitor for preventing metal etching. The composition can further containan organic acid. The composition can effectively strip a photoresist film remaining on a substrate after an etching process without causing corrosions to substrate surfaces and metal surfaces, and also can remove oxides fromthe metal surfaces during a manufacturing process of a semiconductor including a large-scale integrated circuit or a very-large-scale integrated circuit.The present invention also relates to a process for stripping a photoresist film on a substrate using the composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014076356-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019006725-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10866518-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3649513-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11016392-B2 |
| priorityDate |
2009-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |